Please use this identifier to cite or link to this item: https://ndl.ethernet.edu.et/handle/123456789/63094
Title: Defects in High- Gate Dielectric Stacks
Authors: Gusev, Evgeni
Keywords: PVD, HfO2, HfSiON, PDA, Ni-FUSI, SiN cap, oxygen scavenging
Issue Date: 2006
Publisher: Springer
URI: http://10.6.20.12:80/handle/123456789/63094
ISBN: 13 978-1-4020-4367-3
Appears in Collections:Physics

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