Please use this identifier to cite or link to this item:
192.168.6.56/handle/123456789/21926Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | O. Miller, Robert | - |
| dc.date.accessioned | 2018-11-15T20:11:07Z | - |
| dc.date.available | 2018-11-15T20:11:07Z | - |
| dc.date.issued | 2000 | - |
| dc.identifier.isbn | 0-12-752172-0 | - |
| dc.identifier.uri | http://10.6.20.12:80/handle/123456789/21926 | - |
| dc.language.iso | en | en_US |
| dc.publisher | Academic Press | en_US |
| dc.subject | Silicon ;Chemical ;Mechanical | en_US |
| dc.title | Chemical Mechanical Polishing in Silicon Processing SEMICONDUCTORS AND SEMIMETALS Volume 63 | en_US |
| dc.type | Book | en_US |
| Appears in Collections: | Chemistry | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Shin Hwa Li.pdf | 13.84 MB | Adobe PDF | View/Open |
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