Please use this identifier to cite or link to this item: 192.168.6.56/handle/123456789/41405
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dc.contributor.editorHee Park, Jong-
dc.date.accessioned2019-02-07T07:55:04Z-
dc.date.available2019-02-07T07:55:04Z-
dc.date.issued2001-
dc.identifier.isbn0-87170-731-4-
dc.identifier.isbn476en_US
dc.identifier.urihttp://10.6.20.12:80/handle/123456789/41405-
dc.language.isoenen_US
dc.publisherFirst printing,en_US
dc.subjectVapor-platingen_US
dc.subjectRefractory coatingen_US
dc.titleChemical vapor deposition/editeden_US
dc.typeBooken_US
Appears in Collections:Chemical Engineering

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